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In the LPCVD equipment, the Silicon Tube is one of the cores of the entire equipment, with an inner tube and an outer tube. LPCVD equipment is a kind of CVD equipment, which generates solid reactants through chemical reaction of mixed gases under low pressure and high temperature conditions and deposits them on the surface of silicon wafers to form thin films.
CZ for mono-crystalline silicon material, high purity, mature processing and cleaning process
| Product Length | 100mm-2000mm |
| Product Diameter | 80mm-1000mm |
| Product Structure | Welded, Integrated |
| Conductive Type/Doping | Custom |
| Resistivity | Low Resistance (E.G.<0.015, <0.02...). |
| Moderate Resistance (E.G. 1-4); | |
| High Resistance (E.G. 60-90); | |
| Customer Customization | |
| Material Type | Polycrystal/Single Crystal |
| Crystal Orientation | Customized |
It applied to the high-temperature furnace, wafer high-temperature process, deposition process area.
