English
The Silicon Susceptor is utilized in semiconductor CVD and PVD machines to provide support for wafers during high-temperature processes, ensuring stability and preventing any potential damage caused by nitrogen flow or accidental dropping.
Additionally, it can also be utilized as a wafer carrier in semiconductor etching equipment.
The minimum thickness reaches 1mm; High purity; Recyclable and reusable.
Self-developed cleaning technology, the surface metal ion residue meets the requirements of silicon wafer treatment process.
Mature processing process.
The Silicon Susceptor is utilized for transporting the wafer.
