English
The Silicon Pedestal is a pure silicon product designed to ensure temperature stability in the thermal reaction tube during silicon wafer processing, thereby enhancing insulation efficiency. Silicon wafer processing is an extremely precise procedure where temperature plays a crucial role, directly impacting the thickness and uniformity of the silicon wafer film.
Positioned at the lower section of the furnace's thermal reaction tube, the Silicon Pedestal supports the silicon chip carrier while providing effective heat insulation. At the conclusion of the process, it gradually cools down to ambient temperature along with the silicon wafer carrier.
High-purity silicon material can be customized for structural design.
DSTC silicon pedestal is also not easy to cause deformation, reusable, longevous.
| Product Structure | Integrated, Welding |
| Conductive Type/Doping | Custom |
| Resistivity | Low Resistance (E.G.<0.015,<0.02...). ; |
| Moderate Resistance (E.G.1-4); | |
| High Resistance (E.G. 60-90); | |
| Customer Customization | |
| Material Type | Polycrystal/Single Crystal |
| Crystal Orientation | Customized |
It is utilized to stabilize the treatment environment of the crystal boat within the high-temperature furnace chamber, ensuring temperature stability in the thermal reaction tube and enhancing insulation efficiency.
