English
The Silicon Injector is a crucial component in the heat treatment process and deposition of silicon wafers, directly impacting their heat treatment effectiveness and deopsition performance. Heat treatment of silicon wafers plays a vital role in semiconductor and integrated circuit processing, with its outcome closely tied to the final performance of the wafer.
Silicon heat treatment encompasses oxidation, diffusion, annealing, and other processes. During this procedure, semiconductor silicon must be placed inside the furnace body, requiring a pipeline for gas entry into the furnace body known as the silicon Injector.
Applied to HP and deposition equipment, silicon injector is a key component to deliver chemical gases. The deposition thickness is up to 300μm, 10 times of that of quartz injectors.
Adopt integrated drilling process.
Realize customized processing of any length.(3-14mm aperture)
High purity of raw materials.
High metal contamination control to meet the requirements of the silicon wafer treatment process.
Same coefficient of the thermal expansion.
The deposition thickness is up to 300μm, 10 times of that of quartz injectors.
| Product Length | 100mm-1400mm |
| Aperture Size | 4mm-12mm |
| Product Structure | Welded, Integrated, Threaded Connection |
| Conductive Type/Doping | Custom |
| Resistivity | Low Resistance (E.G.<0.015, <0.02...). ; |
| Moderate Resistance (E.G. 1-4); | |
| High Resistance (E.G. 60-90); | |
| Customer Customization | |
| Material Type | Polycrystal/Single Crystal |
Silicon Injector is applied in the HT and deposition machine as the process gas channel. It's the critical component in the HT and deposition process.
